Method of manufacturing a thin film magnetic recording head

Details Method of manufacturing a thin film magnetic recording head Method of manufacturing a thin film magnetic recording head

2007-11-13

2007-11-13

Tugbang, A. Dexter (Department: 3729)

Metal working

Method of mechanical manufacture

Electrical device making

C029S603120, C029S603230, C216S039000, C216S066000, C216S094000, C216S022000, C204S192340, C360S122000, C360S125020

Reexamination Certificate

active

10996466

ABSTRACT:
A invention provides a method of manufacturing a thin film magnetic head is provided, capable of forming a magnetic pole layer as easily as possible. By etching a lower insulating layer and the upper insulating layer by RIE using a fluorine-based gas (CF4or CHF3) or chlorine-based gas (Cl2or BCl3), a magnetic pole formation space R1is formed so as to have a uniform width in an upper insulating layer by and a magnetic pole formation space R2is formed in the lower insulating layer so as to have a width gradually narrowed from width W1to width W4with distance from the magnetic pole formation space R1. After that, a plating film is grown in the magnetic pole formation spaces R1and R2, thereby forming a main magnetic pole layer.

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Jayasekara et al., “A Reactive Ion Milling Process for Patterning Narrow Track Iron Nitride Recording Head Ples at the Wafer Level”, IEEE Transactions on Magnetics, vol. 33, No. 5, Sep. 1997, pp. 2830-2832.

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