Electron beam apparatus and spacer

Details Electron beam apparatus and spacer Electron beam apparatus and spacer

2007-12-18

2007-12-18

Williams, Joseph (Department: 2879)

Electric lamp or space discharge component or device manufacturi

Process

With assembly or disassembly

C445S025000

Reexamination Certificate

active

11251771

ABSTRACT:
A spacer on which static electricity is restricted and an electron beam apparatus in which the spacer is provided. In the electron beam apparatus comprising an electron source provided with electron emission devices, a face plate provided with anodes and spacers installed between the electron source and the face plate, unevenness is formed on the surface of the spacer substrate, and further a thin film which has a smaller thickness than a roughness. This makes possible the restriction of incident angle multiplication coefficient for the primary electrons whose energy is lower than the second cross-point energy of a resistive film. The electron beam apparatus provided with the above spacer is excellent in display definition and long-term reliability since the display of light emission points and the creeping discharge accompanying the static electricity can be restricted due to the spacer.

REFERENCES:
patent: 4181870 (1980-01-01), Stevens
patent: 4904895 (1990-02-01), Tsukamoto et al.
patent: 5029314 (1991-07-01), Katsumi et al.
patent: 5066883 (1991-11-01), Yoshioka et al.
patent: 5523834 (1996-06-01), Ito
patent: 5561340 (1996-10-01), Jin et al.
patent: 5598056 (1997-01-01), Jin et al.
patent: 5690530 (1997-11-01), Jin et al.
patent: 5704820 (1998-01-01), Chandross et al.
patent: 5726529 (1998-03-01), Dean et al.
patent: 5729802 (1998-03-01), Hirabayashi et al.
patent: 5760538 (1998-06-01), Mitsutake et al.
patent: 5811919 (1998-09-01), Hoogsteen et al.
patent: 5939822 (1999-08-01), Alderson
patent: 5970285 (1999-10-01), Ito et al.
patent: 5995786 (1999-11-01), Ito
patent: 6005540 (1999-12-01), Shing et al.
patent: 6153973 (2000-11-01), Shibata et al.
patent: 6222313 (2001-04-01), Smith et al.
patent: 6236157 (2001-05-01), Pan et al.
patent: 6403209 (2002-06-01), Barton et al.
patent: 6420825 (2002-07-01), Shinjo et al.
patent: 6441544 (2002-08-01), Ando et al.
patent: 6657368 (2003-12-01), Kosaka et al.
patent: 6927533 (2005-08-01), Ito et al.
patent: 405262 (1991-01-01), None
patent: 725418 (1996-08-01), None
patent: 0 851 458 (1998-01-01), None
patent: 64-31332 (1989-02-01), None
patent: 2-257551 (1990-10-01), None
patent: 3-55738 (1991-03-01), None
patent: 4-28137 (1992-01-01), None
patent: 8-180821 (1996-07-01), None
patent: 10-144203 (1998-05-01), None
W. P. Dyke et al, “Field Emission”, Advances in Electronics and Electron Physics, 1956, vol. VIII, pp. 89-185.
C. A. Mead, “Operation of Tunnel-Emission Devices”, Journal of Applied Physics, Apr. 1961, vol. 32, No. 4, pp. 646-652.
G. Dittmer, “Electrical Conduction and Electron Emission of Discontinuous Thin Films”, Thin Solid Films, 1972, pp. 317-328, no month.
M. Hartwell et al., “Strong Electron Emission From Patterned Tin-Indium Oxide Thin Films”, IEDM Technical Digest, 1975, pp. 519-521, no month.
M. I. Elinson et al., “The Emission of Hot Electrons and the Field Emission of Electrons from Tin Oxide”, Radio Engineering and Electronic Physics, Jul. 1965, pp. 1290-1296.
C. A. Spindt et al., “Physical Properties of Thin-Film Field Emission Cathodes with Molybdenum Cones”, Journal of Applied Physics, Dec. 1976, vol. 47, No. 12, pp. 5248-5263.
H. Araki et al., “Electroforming and Electron Emission of Carbon Thin Films”, Journal of the Vacuum Society of Japan, Jan. 1983, vol. 26, No. 1, pp. 22-29.
R. Meyer, “Recent Development on ‘Microtips’ Display at Leti”, Technical Digest of IVMC 91, 1991, pp. 6-9, no month.

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