Structure and method for adjusting integrated circuit...

Electrical resistors – With base extending along resistance element – Resistance element coated on base

Reexamination Certificate

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C338S202000, C338S322000

Reexamination Certificate

active

10953478

ABSTRACT:
A resistor formed on a material layer of a semiconductor integrated circuit and a method for forming the resistor. The resistor comprises a region of resistive material with a plurality of conductive contacts or plugs in electrical contact with and extending away from the resistive material. A first and a second interconnect line are formed overlying the plugs and in conductive contact with one or more of the plurality of plugs, such that a portion of the resistive material between the first and the second interconnect lines provides a desired resistance. According to a method of the present invention, the plurality of conductive contacts are formed using a first photolithographic mask and the first and the second interconnect lines are formed using a second photolithographic mask. The desired resistance is changed by modifying the first or the second mask such that one or more dimensions of a region of the resistive material between the first and the second interconnect lines is altered.

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European Search Report, Dated Dec. 23, 2005.

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