Method of generation of charged particle beam exposure data...

Details Method of generation of charged particle beam exposure data... Method of generation of charged particle beam exposure data...

2007-06-19

2007-06-19

Nguyen, Kiet T. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

Reexamination Certificate

active

11106721

ABSTRACT:
A method of generation of exposure data for charged particle beam exposure using a block mask, in which a first transmission beam is formed by transmission of a charged particle beam through a rectangular first transmission aperture; a second transmission beam is formed by causing the first transmission beam to be transmitted through a block mask having a plurality of discrete patterns; and the second transmission beam irradiates an object for exposure. This exposure data generation method has a step of generating irradiation position data of the first transmission beam on the block mask, such that the Y-direction or X-direction edge of the first transmission beam is positioned in a common isolated area in the X direction or Y direction of the plurality of discrete patterns in the block mask.

REFERENCES:
patent: 5376802 (1994-12-01), Sakamoto et al.
patent: 2849184 (1998-11-01), None

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