Method of manufacturing semiconductor device, semiconductor...

Details Method of manufacturing semiconductor device, semiconductor... Method of manufacturing semiconductor device, semiconductor...

Filed on

2007-10-16

Date issued

2007-10-16

Examiner

Kim, Robert (Department: 2881)

Patent Class

Radiant energy

SubClass

Irradiation of objects or material

SubSubClass

Irradiation of semiconductor devices

Other Related Categories

C250S492230, C250S492200, C250S3960ML

Type

Reexamination Certificate

Status

active

Patent number

11284035

Description

ABSTRACT:
A manufacturing apparatus of a semiconductor device is disclosed, which comprises an implantation source which applies particles or an electromagnetic wave into an implantation region of a semiconductor substrate in a θ direction shifted by an angle θ from a vertical direction of the semiconductor substrate, a first stencil mask disposed between the semiconductor substrate and the implantation source, the first stencil mask having a first opening corresponding in the θ direction to the implantation region, and a second stencil mask disposed between the first stencil mask and the implantation source, the second stencil mask having a second opening corresponding in the θ direction to the implantation region.

REFERENCES:
patent: 4524278 (1985-06-01), Le Poole
patent: 4560878 (1985-12-01), Knauer et al.
patent: 5838058 (1998-11-01), Kitajima et al.
patent: 6214498 (2001-04-01), Choi
patent: 2002/0058400 (2002-05-01), Suguro et al.
patent: 49-68660 (1974-07-01), None
patent: 2002-203806 (2002-07-01), None
patent: 2002-237447 (2002-08-01), None
patent: WO 02/052662 (2002-07-01), None

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