Method of manufacturing microlens array

Details Method of manufacturing microlens array Method of manufacturing microlens array

2007-06-19

2007-06-19

Harrington, Alicia M (Department: 2873)

Optical: systems and elements

Single channel simultaneously to or from plural channels

By surface composed of lenticular elements

Reexamination Certificate

active

10768024

ABSTRACT:
A positive resist layer formed on a translucent substrate is subjected to exposure and development to form circular resist patterns disposed near each other at a predetermined distance. The exposure pattern has an opening of a plurality of circular ring shape surrounding the plurality of resist patterns. The opening may have a width equal to the predetermined distance. Since the width of the opening is constant over the whole outer periphery of each resist pattern, uniform exposure can be realized at all positions along the periphery to form a perfect circle shape. After a convex lens shape is given to each resist pattern by heating and reflow process, the convex lens shape is transferred to the substrate by dry etching process using the resist patterns as a mask to form a microlens array with convex lenses.

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English translation of Chinese Office Action (issued Feb. 18, 2005).

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