Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1994-11-15
1996-06-04
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430308, 219 6917, 219 692, G03F 900
Patent
active
055231853
ABSTRACT:
A method for manufacturing a stencil mask in provided, in which precise patterning and a sufficient thickness of the absorber film are ensured, and manufacturing steps are simplified. Temporary holes 1h are formed on the substrate 1 based on the precise mask pattern of the intermediate film 2. The absorber film 3 is formed on the intermediate film 2, while an extra portion of the absorber film is deposited and stored in the temporary holes 1h. The absorber film 3 is made sufficiently thick while maintaining the precise patterning of the intermediate film 2. A window 6 is formed from the rear surface of the substrate penetrating through the substrate, through which beams pass. The temporary holes 1h and the extra portion of the absorber film are naturally removed during the forming of the window 6.
REFERENCES:
patent: 5401932 (1995-03-01), Hashimoto et al.
Rosasco S.
Sanyo Electric Co,. Ltd.
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