Optics: measuring and testing – Lens or reflective image former testing
Reexamination Certificate
2007-07-24
2007-07-24
Toatley, Jr., Gregory J. (Department: 2877)
Optics: measuring and testing
Lens or reflective image former testing
C356S401000, C430S022000, C430S030000
Reexamination Certificate
active
11220701
ABSTRACT:
There is disclosed an exposure method for correcting a focal point, comprising: illuminating a mask, in which a mask-pattern including at least a set of a first mask-pattern and a second mask-pattern mutually different in shape is formed, from a direction in which a point located off an optical axis of an exposure apparatus is a center of illumination, and exposing and projecting an image of said mask-pattern toward an image-receiving element; measuring a mutual relative distance between images of said first and second mask-patterns exposed and projected on said image-receiving element, thereby measuring a focal point of a projecting optical system of said exposure apparatus; and moving said image-receiving element along a direction of said optical axis of said exposure apparatus on a basis of a result of said measurement, and disposing said image-receiving element at an appropriate focal point of said projecting optical system.
REFERENCES:
patent: 5208629 (1993-05-01), Matsuo et al.
patent: 5331369 (1994-07-01), Terasawa et al.
patent: 6088113 (2000-07-01), Kim
patent: 6633390 (2003-10-01), Shiode et al.
patent: 6701512 (2004-03-01), Sutani et al.
patent: 6743554 (2004-06-01), Nakao
patent: 6764794 (2004-07-01), Nakao et al.
patent: 6797443 (2004-09-01), Nakao et al.
patent: 6811939 (2004-11-01), Nakao et al.
patent: 2002/0155356 (2002-10-01), Masashi
patent: 2003/0091913 (2003-05-01), Shiode
patent: 1422562 (2004-05-01), None
patent: 06-120116 (1994-04-01), None
patent: 7-254551 (1995-10-01), None
patent: 09-237752 (1997-09-01), None
patent: 2001-250760 (2001-09-01), None
patent: 2001-250769 (2001-09-01), None
patent: 1998-067515 (1998-10-01), None
Notification of the First Office Action from the State Intellectual Property Office of the People's Republic of China dated Mar. 25, 2005, in patent application No. 02149225.5, and English translation.
Office Action from Korean Intellectual Property Office, Dec. 6, 2004.
Seong, Nakegeuon et al.,Pattern Displacement Error under Off Axis Illumination, Jpn. J. Appl. Phys., vol. 37, Dec. 1998, pp. 6695-6697.
Netherlands Bureau for Industrial Property Search Report, Aug. 26, 2004.
Brunner et al., IBM, “Quantitative Stepper Metrology Using The Focus Monitor Test Mask”, SPIE vol. 2197 (1994), pp. 541-549.
Brunner et al., IBM, Simulations And Experiments With The Phase Shift Focus Monitor:, SPIE vol. 2726 (1996), pp. 236-243.
Nakao et al., Mitsubishi Electric Corp., Extended Abstracts (The 48th Spring Meeting, 2001); The Japan Society of Applied Physics and Related Societies (Mar. 2001), p. 733.
Takashi Sato et al.,Coma Aberration Measurement by Relative Shift of Displacement with Pattern Dependence, Japanese Journal of Applied Physics, vol. 37, pp. 3553-3557 (1998).
Hiroshi Nomura et al.,Techniques for Measuring Aberrations in Lenses Used in Photolithography with Printed Patterns, Applied Optics, vol. 38, No. 13, pp. 2800-2807, May 1, 1999.
Ikeda Takahiro
Inoue Soichi
Mimotogi Shoji
Sato Takashi
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
Stock, Jr. Gordon J.
Toatley , Jr. Gregory J.
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