Exposure apparatus

Details Exposure apparatus Exposure apparatus

2007-07-17

2007-07-17

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S072000, C355S075000, C378S034000, C378S035000, C250S492200, C356S400000

Reexamination Certificate

active

11449812

ABSTRACT:
An exposure apparatus which exposes substrates to a pattern on a master. The apparatus includes first, second and third chucks which hold the substrates, a first fine adjustment stage which holds the first chuck to perform fine driving, a second fine adjustment stage which holds the second chuck to perform fine driving, a coarse adjustment stage on which the first and second fine adjustment stages are mounted and which can move in an X-Y plane substantially perpendicular to an optical axis, an exposure unit which performs exposure operation for the substrate held by the first chuck, a measurement unit which performs measurement operation for the substrate held by the second chuck, and a controller which drives the coarse adjustment stage and causes the measurement and exposure units to perform the measurement and exposure operations, respectively.

REFERENCES:
patent: 4496239 (1985-01-01), Isohata et al.
patent: 4659227 (1987-04-01), Sato et al.
patent: 4747608 (1988-05-01), Sato et al.
patent: 4870288 (1989-09-01), Abuku et al.
patent: 5270771 (1993-12-01), Sato
patent: 5499099 (1996-03-01), Sato et al.
patent: 5504407 (1996-04-01), Wakui et al.
patent: 5511930 (1996-04-01), Sato et al.
patent: 5585925 (1996-12-01), Sato et al.
patent: 5608492 (1997-03-01), Sato
patent: 5715064 (1998-02-01), Lin
patent: 5753926 (1998-05-01), Sato
patent: 5757149 (1998-05-01), Sato et al.
patent: 5993081 (1999-11-01), Itoh et al.
patent: 6341007 (2002-01-01), Nishi et al.
patent: 6400441 (2002-06-01), Nishi et al.
patent: 6437463 (2002-08-01), Hazelton et al.
patent: 6549269 (2003-04-01), Nishi et al.
patent: 6590634 (2003-07-01), Nishi et al.
patent: 6590636 (2003-07-01), Nishi
patent: 6778258 (2004-08-01), del Puerto et al.
patent: 6819404 (2004-11-01), Tanaka
patent: 2003/0002021 (2003-01-01), Sato
patent: 2004/0032575 (2004-02-01), Nishi et al.
patent: 2004/0165172 (2004-08-01), Poon et al.
patent: 2005/0005702 (2005-01-01), Osuga
patent: 2005/0236908 (2005-10-01), Rivin
patent: 10-163098 (1998-06-01), None
patent: 3045947 (2000-03-01), None
patent: WO 98/28665 (1998-07-01), None

Affiliated with

Also associated with

Rating

Exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3817466