Enhanced alumina layer produced by CVD

Details Enhanced alumina layer produced by CVD Enhanced alumina layer produced by CVD

2007-01-16

2007-01-16

Turner, Archene (Department: 1775)

Stock material or miscellaneous articles

Structurally defined web or sheet

Including components having same physical characteristic in...

C051S307000, C051S309000, C428S325000, C428S336000, C428S697000, C428S698000, C428S699000, C428S701000, C428S702000

Reexamination Certificate

active

10431505

ABSTRACT:
The present invention introduces a new and refined method to produce α-Al2O3layers with substantially better wear resistance and toughness than the prior art. The α-Al2O3layer of the present invention is formed on a bonding layer of (Ti,Al)(C,O,N) with increasing aluminium content towards the outer surface. Nucleation of α-Al2O3is obtained through a nucleation step being composed of both aluminising and oxidisation steps. The α-Al2O3layer according to this invention has a thickness ranging from 1 to 20 μm and is composed of columnar grains. The length/width ratio of the alumina grains is from 2 to 12, preferably 5 to 9. The layer is characterised by a strong (012) growth texture, measured using XRD, and by the almost total absence (104), (110), (113) and (116) diffraction peaks.

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