Manufacturing process developing method for semiconductor...

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C700S100000, C700S103000, C700S121000

Reexamination Certificate

active

10921150

ABSTRACT:
Before a process design stage of judging whether a process flow involves any problems, items and standards of a process PAC, which is a PAC of a process necessary for development of a manufacturing process, and of an element PAC, which is a PAC of an element technology used in the process are set, while linking the process PAC and the element PAC with each other.

REFERENCES:
patent: 5134560 (1992-07-01), Ferriter et al.
patent: 5285392 (1994-02-01), Kyle et al.
patent: 5991528 (1999-11-01), Taylor et al.
patent: 6128588 (2000-10-01), Chacon
patent: 6411377 (2002-06-01), Noguchi et al.
patent: 6438436 (2002-08-01), Hohkibara et al.
patent: 6535784 (2003-03-01), Joma et al.
patent: 6546308 (2003-04-01), Takagi et al.
patent: 6597962 (2003-07-01), Nonaka
patent: 6694202 (2004-02-01), Miyazaki
patent: 6711454 (2004-03-01), Joma et al.
patent: 6714830 (2004-03-01), Browning
patent: 6763277 (2004-07-01), Allen et al.
patent: 6807655 (2004-10-01), Rehani et al.
patent: 6885977 (2005-04-01), Gavra et al.
patent: 6889178 (2005-05-01), Chacon
patent: 2002/0165744 (2002-11-01), Juras et al.
patent: 2002/0168787 (2002-11-01), Noguchi et al.
Kimura, Masahide. “The Design Ability, from Design Philosophy to Implementation, Why Matsushita Took a Lead in Mass-Production of 0.13 m Devices”, Nikkei Microdevices, pp. 89-96, published on May 2003.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Manufacturing process developing method for semiconductor... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Manufacturing process developing method for semiconductor..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Manufacturing process developing method for semiconductor... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3810804

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.