Film-fabricating method and apparatus for the same

Details Film-fabricating method and apparatus for the same Film-fabricating method and apparatus for the same

1983-10-12

1985-07-02

Smith, John D.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

118 501, 118719, 118723, 118730, 427 39, 4272552, 4272553, 4272555, B05D 306, C23C 1208

Patent

active

045268053

ABSTRACT:
In a film-fabricating apparatus, a reaction chamber and a film-forming chamber which contains a substrate on which a film is deposited are provided. Two chambers are communicated with each other by a communication device which allows for the conduction of activated molecular species grown in the reaction chamber to the film-forming chamber, and prevents light beams emitted during the decomposition of raw gas from being carried into the film-forming chamber. A first cylinder is connected to the reaction chamber, to supply a raw gas to the reaction chamber. An exhausting pump is connected to the film-forming chamber, to decompress the interior of the film-forming chamber. A pair of electrodes, one of which is connected to a power source and the other is grounded, are provided in the reaction chamber, to decompose the raw gas and product activated molecular species.

REFERENCES:
patent: 3297465 (1967-01-01), Connell et al.
patent: 4066527 (1978-01-01), Takagi et al.
patent: 4161418 (1979-07-01), Morimoto et al.
patent: 4397885 (1983-08-01), Akai

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