Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the...
Reexamination Certificate
2007-01-16
2007-01-16
Lee, Wilson (Department: 2163)
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
C156S345440
Reexamination Certificate
active
10793253
ABSTRACT:
A method and apparatus for generating and controlling a plasma (130) formed in a capacitively coupled plasma system (100) having a plasma electrode (140) and a bias electrode in the form of a workpiece support member (170), wherein the plasma electrode is unitary and has multiple regions (Ri) defined by a plurality of RF power feed lines (156) and the RF power delivered thereto. The electrode regions may also be defined as electrode segments (420) separated by insulators (426). A set of process parameters A={n, τi, Φi, Pi, S; Li} is defined; wherein n is the number of RF feed lines connected to the electrode upper surface at locations Li, τiis the on-time of the RF power for the ithRF feed line, Φiis the phase of the ithRF feed line relative to a select one of the other RF feed lines, Piis the RF power delivered to the electrode through the ithRF feed line at location Li, and S is the sequencing of RF power to the electrode through the RF feed lines. One or more of these parameters are adjusted so that operation of the plasma system results in a workpiece (176) being processed with a desired amount or degree of process uniformity.
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Mitrovic Andrej S.
Parsons Richard
Quon Bill H.
Sirkis Murray D.
Strang Eric J.
Lee Wilson
Pillsbury Winthrop Shaw & Pittman LLP
Tokyo Electron Limited
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