Apparatus for inspection of a wafer

Details Apparatus for inspection of a wafer Apparatus for inspection of a wafer

2007-07-24

2007-07-24

Toatley, Jr., Gregory J. (Department: 2886)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

Reexamination Certificate

active

10854275

ABSTRACT:
The invention concerns an apparatus for inspection of a wafer, encompassing at least one incident-light illumination device that radiates an illuminating light beam which is incident obliquely onto a surface of a wafer to be inspected, and an image capture device for capturing an image of the surface in a dark-field arrangement. The wafer inspection apparatus is characterized in that at least one deflection device is provided in order to deflect an associated illuminating light beam onto the surface of the wafer.

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Peterson et al., “Lithography Defects: Reducing and Managing Yield Killers Through Photo Cell Monitoring,” Yield Management Solutions, (Spring 2000), pp. 17-24.

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