Metal working – Method of mechanical manufacture – Electrical device making
Reexamination Certificate
2007-07-03
2007-07-03
Kim, Paul D (Department: 3729)
Metal working
Method of mechanical manufacture
Electrical device making
C029S603070, C029S603150, C029S603160, C029S603180, C216S022000, C216S065000, C360S122000, C360S125330, C360S317000, C360S324110, C427S127000, C427S128000, C451S005000, C451S029000, C451S041000, C451S057000, C451S060000
Reexamination Certificate
active
10909121
ABSTRACT:
A method is described which uses a CMP resistant metal layer to replace the upper dielectric layer in the track width definition phase of a TMR or CPP spin valve magnetic head. The metal which is selected to be resistant to the CMP process can be rhodium (Rh), platinum (Pt), chromium (Cr), vanadium (V), etc. The additional CMP resistance of the refill layer structure provides a much larger processing window which results in higher yields. A CPP head according to the invention has a metal layer according to the invention above the hard bias structures on the sides of the sensor which define the track width.
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Cyrille Marie-Claire
Dill Frederick Hayes
Li Jui-Lung
Hitachi Global Storage Technologies - Netherlands B.V.
Kim Paul D
Knight G. Marlin
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