Electrostatic gating

Details Electrostatic gating Electrostatic gating

2007-03-13

2007-03-13

Stephens, Juanita D. (Department: 2853)

Incremental printing of symbolic information

Ink jet

Ejector mechanism

C347S056000

Reexamination Certificate

active

10960599

ABSTRACT:
Various systems and techniques are disclosed for stopping, selectively controlling, and optimizing a flow of particles in a flowing stream. The systems and techniques utilize a multi-electrode assembly and various voltage waveforms applied to those electrodes. The particles flow past or near the electrode assembly and their flow is controlled by the configuration and arrangement of the electrodes and the voltage waveforms applied thereto. An additional strategy for countering particle leakage flow is also described.

REFERENCES:
patent: 4896174 (1990-01-01), Stearns
patent: 5893015 (1999-04-01), Mojarradi et al.
patent: 6116718 (2000-09-01), Peeters et al.
patent: 6134412 (2000-10-01), Thompson
patent: 6137979 (2000-10-01), Gartstein et al.
patent: 6219515 (2001-04-01), Lestrange
patent: 6246855 (2001-06-01), Gartstein et al.
patent: 6272296 (2001-08-01), Gartstein
patent: 6290342 (2001-09-01), Vo et al.
patent: 6293659 (2001-09-01), Floyd et al.
patent: 6328409 (2001-12-01), Peeters et al.
patent: 6340216 (2002-01-01), Peeters et al.
patent: 6351623 (2002-02-01), Thayer et al.
patent: 6416158 (2002-07-01), Floyd et al.
patent: 6416159 (2002-07-01), Floyd et al.
patent: 6439711 (2002-08-01), Carlini et al.
patent: 6454384 (2002-09-01), Peeters et al.
patent: 6467862 (2002-10-01), Peeters et al.
patent: 6467871 (2002-10-01), Moffat et al.
patent: 6499831 (2002-12-01), Schmidlin
patent: 6511149 (2003-01-01), Peeters et al.
patent: 6521297 (2003-02-01), McDougall et al.
patent: 6523928 (2003-02-01), Peeters et al.
patent: 6598954 (2003-07-01), Moffat et al.
patent: 6719399 (2004-04-01), McDougall et al.
patent: 6751865 (2004-06-01), Peeters et al.
U.S. Appl. No. 10/960,593, filed Oct. 2006, Lean et al.

Affiliated with

Also associated with

Rating

Electrostatic gating does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electrostatic gating, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrostatic gating will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3799169