High voltage semiconductor device having an improved DV/DT capab

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

357 20, 357 236, 357 55, 357 68, 357 86, H01L 2974

Patent

active

046225722

ABSTRACT:
A semiconductor device used for high voltage applications exhibits reduced susceptibility to being inadvertently turned-on by capacitive charging currents generated by relatively high voltage transients impressed across an anode and a cathode of the device. The capacitive charging currents are manifested as a gate current which in a thyristor renders the device conductive if it exceeds a critical value and in a transistor is multiplied by the current gain. Various embodiments employing capacitors are disclosed for reducing the level and/or the duration of the transient produced gate current.

REFERENCES:
patent: 3368121 (1968-02-01), Herlet et al.
patent: 3619738 (1971-11-01), Otsuka
patent: 4047219 (1977-09-01), Temple
patent: 4224634 (1980-09-01), Suedberg
patent: 4243997 (1981-01-01), Natori et al.
D. Hamilton et al., "Basic Integrated Circuit Engineering", .COPYRGT.1975 McGraw-Hill, Inc., pp. 14, 15.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

High voltage semiconductor device having an improved DV/DT capab does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High voltage semiconductor device having an improved DV/DT capab, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High voltage semiconductor device having an improved DV/DT capab will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-379678

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.