Method of making a semiconductor device manufacturing mask...

Details Method of making a semiconductor device manufacturing mask... Method of making a semiconductor device manufacturing mask...

2007-01-02

2007-01-02

Letscher, Geraldine (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000, C430S322000, C430S323000, C378S035000

Reexamination Certificate

active

11101396

ABSTRACT:
A method of making a semiconductor device manufacturing mask, which makes it possible to suppress a semiconductor-device global step and simply manufacture a highly reliable semiconductor device. Square dummy patterns each having one side of, for example, 0.25 μm or less are inserted into an area other than an actual pattern lying within a semiconductor device manufacturing mask to thereby uniformize a pattern density, enable etching processing without changing conditions set for every semiconductor device manufacturing mask an prevent an increase in global step of a post-CMP interlayer insulating film.

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