Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Reexamination Certificate
2007-05-01
2007-05-01
Padgett, Marianne (Department: 1762)
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
C427S553000, C427S584000, C427S582000, C427S581000, C427S595000, C427S597000
Reexamination Certificate
active
10698884
ABSTRACT:
An element is deposited by flowing a gas through a solid donor compound that includes the element, and over a substrate. The flow of gas deposits a film of a few monolayers of donor compound on the substrate. An optical radiation source (e.g., a femtosecond laser) which produces optical radiation at an instantaneous intensity sufficient to cause non linear or otherwise enhanced interaction between optical radiation photons and the donor compound is used to decompose the donor compound and deposit the metal on the substrate. After an initial deposit of the donor compound is produced, optical radiation can be absorbed and heat the substrate in the localized area of the deposit in order to accelerate the deposition process by thermally decomposing the donor compound.
REFERENCES:
patent: 4340617 (1982-07-01), Deutsch et al.
patent: 4451503 (1984-05-01), Blum et al.
patent: 4608117 (1986-08-01), Ehrlich et al.
patent: 4615904 (1986-10-01), Ehrlich et al.
patent: 4711790 (1987-12-01), Morishige
patent: 4769310 (1988-09-01), Gugger et al.
patent: 4948629 (1990-08-01), Hacker et al.
patent: 5060595 (1991-10-01), Ziv et al.
patent: 5130172 (1992-07-01), Hicks et al.
patent: 5246745 (1993-09-01), Baum et al.
patent: 5308651 (1994-05-01), Ohta et al.
patent: 5407710 (1995-04-01), Baum et al.
patent: 5686206 (1997-11-01), Baum et al.
patent: 5753320 (1998-05-01), Mikoshiba et al.
patent: 6090507 (2000-07-01), Grenon et al.
patent: 6261850 (2001-07-01), Marsh
patent: 6312768 (2001-11-01), Rode et al.
patent: 6319566 (2001-11-01), Polanyi et al.
patent: 6465054 (2002-10-01), Effenberger
patent: 6480074 (2002-11-01), Kaitila et al.
R. Solanki et al, “Laser Photodeposition of Refractory Metals”, App. Phys. Lett. 38(7) Apr. 1, 1981, pp. 572-574.
D.K. Flynn et al, “Deposition of Refractory Metal Films by Rare-Gas Halide Laser Photodissociation of Metal Carbonyls”, J. Appl. Phys. 59(11), Jun. 1, 1986, pp. 3914-3917.
S.A. Trushin et al., “Femtosecond Dynamics and Vibrational Coherence in Gas-Phase Ultraviolet Photodecomposition of CR(CO)6”, J. Phys. Chem. A 1998, 102, pp. 4129-4137, no month.
R. Alexandrescu, “Laser-Stimulated Processes in Metal Carbonyls for Metal-Based Film Synthesis”, Applied surface Science 106 (1996) pp. 28-37, no month.
H.H. Gilgen et al., “Direct Writing of Metal Conductors with Near -uv Light”, Appl. Phys. B 42, 55-66 (1987), pp. 55-66, no month.
Haight Richard A.
Longo Peter P.
Wagner Alfred
August Casey
Fleit Kain Gibbons Gutman Bongini & Bianco P.L.
Guinta Jeffrey N.
Padgett Marianne
LandOfFree
Method and apparatus for performing laser CVD does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for performing laser CVD, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for performing laser CVD will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3789979