Lithographic apparatus, device manufacturing method

Details Lithographic apparatus, device manufacturing method Lithographic apparatus, device manufacturing method

2007-07-17

2007-07-17

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000

Reexamination Certificate

active

11246549

ABSTRACT:
To compensate for birefringence of a mask in a lithographic projection apparatus, the birefringence of a mask is measured and stored as birefringence data in a data storage device. A birefringent compensation element is disposed in the optical path of the lithographic projection apparatus. Appropriate adjustments of the compensation element are determined as those optimally reducing impact of the mask birefringence on the state of polarization at substrate level.

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patent: 2004/0257553 (2004-12-01), Totzeck
Fujii et al., On Board Polarization Measuring Instrument for High NA Excimer Scanner, Metrology, Inspection, and Process Control for Microlithography XIX, Proc. of SPIE vol. 5752, (2005), pp. 846-852.
Nishinaga et al., Development of Polarized-Light Illuminator and Its Impact, Optical Microlithography XVIII, SPIE vol. 5754 (2005), pp. 669-680.
European Search Report issued for European Patent Application No. 05256041.4-2222, dated Jun. 14, 2006.
Kohler, et al., “Imaging Enhancements by Polarized Illumination: Theory and Experimental Verification,” Proceedings of SPIE, vol. 5754, 2005, pp. 734-750.
Van de Kerkhof, et al., “Full Optical Column Characterization of DUV Lithographic Projection Tools,” Proceedings of SPIE, vol. 5377, 2004, pp. 1960-1970.

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