Exposure apparatus, exposure method, and method for...

Details Exposure apparatus, exposure method, and method for... Exposure apparatus, exposure method, and method for...

2007-09-11

2007-09-11

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S030000

Reexamination Certificate

active

11211749

ABSTRACT:
An exposure apparatus EX exposes a substrate P by projecting an image of a predetermined pattern through a liquid1onto the substrate. The exposure apparatus includes a projection optical system which performs the projection, and a liquid supply mechanism10which supplies the liquid onto the substrate to form a liquid immersion area AR2on a part of the substrate. The liquid supply mechanism supplies the liquid1onto the substrate P simultaneously from a plurality of positions which are apart, in a plurality of different directions, from the projection area AR1. The exposure apparatus is capable of forming the liquid immersion area stably and recovering the liquid satisfactorily. It is possible to perform the exposure process accurately while avoiding, for example, the outflow of the liquid to the surroundings.

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