Positive type resist composition

Details Positive type resist composition Positive type resist composition

2007-05-08

2007-05-08

Wu, David W. (Department: 1713)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

At least one aryl ring which is part of a fused or bridged...

C524S385000, C524S291000, C524S317000, C524S320000, C430S270100

Reexamination Certificate

active

10694171

ABSTRACT:
A positive type resist composition comprising: (A) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure, which increases the solubility in an alkali developing solution by the action of an acid; (B) a compound capable of generating an acid upon irradiation with an actinic ray or a radiation; and (C) an alkoxy alcohol as a solvent, wherein an alkoxy group and an alcoholic hydroxyl group are connected to each other via at least three carbons.

REFERENCES:
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patent: 6610638 (2003-08-01), Tanigawa et al.
patent: 6673518 (2004-01-01), Nishi et al.
patent: 6692897 (2004-02-01), Fujimori et al.
patent: 6818148 (2004-11-01), Watanabe et al.
patent: 2000-159758 (2000-06-01), None
patent: WO 00/58252 (2000-10-01), None
Allen, Robert D. et al. High performance acrylic polymers for chemically amplified photoresist applications, J. Vac. Sci. Technol. B 9(6), Nov./Dec. 1991, pp. 3357-3361.

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