Method of forming inorganic alignment film, inorganic...

Optical: systems and elements – Optical modulator

Reexamination Certificate

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C359S291000, C427S567000, C428S001210

Reexamination Certificate

active

10931813

ABSTRACT:
A method of forming an inorganic alignment film on a base substrate is provided comprising forming a film made substantially of an inorganic material on the base substrate, and irradiating ion beams onto the surface of the film from a direction inclined at a predetermined angle θbwith respect to the direction vertical to the surface. By irradiating the ion beams onto the film, concave portions having a predetermined directivity are formed on the film. The predetermined angle θbis preferably 2° or more.

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Examination result issued in Chinese application No. 10-2004-0070434.
Examination result issued in Chinese application No. 10-2004-0069723.

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