Photographic light-sensitive material having improved antistatic

Details Photographic light-sensitive material having improved antistatic Photographic light-sensitive material having improved antistatic

1985-03-11

1986-11-11

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Identified backing or protective layer containing

430631, G03C 182

Patent

active

046222880

ABSTRACT:
A photographic light-sensitive material containing a fluorine-containing graft polymer is disclosed. The graft polymer is derived from a polymerizable hydrophobic fluorine-containing monomer containing at least one fluorine atom and a polymerizable hydrophilic monomer, and optionally, a third polymerizable hydrophobic monomer containing no fluorine atom. The material has an improved antistaticity.

REFERENCES:
patent: 3753716 (1973-08-01), Ishihara et al.
patent: 4229526 (1980-10-01), Yoneyama et al.
patent: 4266015 (1981-05-01), Bulter et al.
patent: 4366138 (1982-12-01), Yoneyama et al.
patent: 4495275 (1985-07-01), Yokoyama et al.

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