Projection exposure apparatus

Details Projection exposure apparatus Projection exposure apparatus

2007-05-29

2007-05-29

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S067000, C355S071000

Reissue Patent

active

09320472

ABSTRACT:
A projection exposure apparatus includes illuminating optical means for illuminating a projection negative, and projection optical means for projection-exposing the projection negative illuminated by the illuminating optical means onto a substrate, the illuminating optical means including light source means for supplying exposure light, annular light source forming means for forming an annular secondary light source by the light from the light source means, and condenser means for condensing the light beam from the annular light source forming means on the projection negative, and is designed to satisfy the following condition:in-line-formulae description="In-line Formulae" end="lead"?⅓≦d1/d2≦⅔,in-line-formulae description="In-line Formulae" end="tail"?where d1is the inner diameter of the annular secondary light source, and d2is the outer diameter of the annular secondary light source.

REFERENCES:
patent: 4498742 (1985-02-01), Uehara
patent: 4668077 (1987-05-01), Tanaka
patent: 4704027 (1987-11-01), Phillips
patent: 4831276 (1989-05-01), Hyakumura
patent: 4902115 (1990-02-01), Takahashi
patent: 4931830 (1990-06-01), Suwa et al.
patent: 4933754 (1990-06-01), Reed et al.
patent: 5160962 (1992-11-01), Miura et al.
patent: 5168157 (1992-12-01), Kimura
patent: 5208629 (1993-05-01), Matsuo et al.
patent: 5253040 (1993-10-01), Kamon et al.
patent: 5329333 (1994-07-01), Noguchi et al.
patent: 5367404 (1994-11-01), Hayata
patent: 5489966 (1996-02-01), Kawashima et al.
patent: 5627626 (1997-05-01), Inoue et al.
patent: 5757470 (1998-05-01), Dewa et al.
patent: 6078380 (2000-06-01), Taniguchi et al.
patent: 61-91662 (1986-05-01), None
patent: 2-166717 (1990-06-01), None
patent: 5/175100 (1993-07-01), None
“Super-Resolution Lithography (2) Resolution Improvement with Annular Illumination,” K. Tounai et al., Extended Abstracts (The 52 Autumn Meeting 1991); The Japan Society of Applied Physics, Oct. 9-12, 1991.

Affiliated with

Also associated with

Rating

Projection exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Projection exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3767846