Exposure head with spatial light modulator

Details Exposure head with spatial light modulator Exposure head with spatial light modulator

2007-03-06

2007-03-06

Pham, Hai (Department: 2853)

Incremental printing of symbolic information

Light or beam marking apparatus or processes

Scan of light

C347S256000

Reexamination Certificate

active

10898233

ABSTRACT:
In an exposure head of the invention, plural first micro-focusing elements are arranged in a first microlens array so as to correspond to plural micromirrors in a DMD. An aperture array that includes plural apertures arranged so as to respectively correspond to the plural first micro-focusing elements is disposed. The apertures allow only main portions of Fraunhofer diffraction images to be transmitted therethrough. The main portions of the Fraunhofer diffraction images transmitted through the apertures are imaged on an exposure plane by second micro-focusing elements of a second microlens array. According to the exposure head of the invention, cross-talk light and scattered light can be effectively reduced, and beam diameters of beam spots projected on the exposure plane through the apertures can be adjusted to a required size.

REFERENCES:
patent: 5231464 (1993-07-01), Ichimura et al.
patent: 6133986 (2000-10-01), Johnson
patent: 6473237 (2002-10-01), Mei
patent: 2002/0114084 (2002-08-01), Summersgill et al.
patent: 2004/0027681 (2004-02-01), Sunagawa et al.
patent: 2004/0156130 (2004-08-01), Powell et al.
patent: 2001185792 (2001-07-01), None

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