Step-over lithography to produce parabolic photoresist...

Details Step-over lithography to produce parabolic photoresist... Step-over lithography to produce parabolic photoresist...

2007-03-13

2007-03-13

Mack, Ricky (Department: 2873)

Optical: systems and elements

Single channel simultaneously to or from plural channels

By surface composed of lenticular elements

C216S026000, C430S321000

Reexamination Certificate

active

11416983

ABSTRACT:
A method of microlens fabrication for use in a photosensor includes preparing a photodetector element array which is sensitive to light in a specific color domain and depositing microlens material on the photodetector element array. The structure is coated with photoresist, and the photoresist is masked and exposed in a separate exposure for each color in the color domain. The photoresist is developed and the microlens material etched to form a microlens array.

REFERENCES:
patent: 5324623 (1994-06-01), Tsumori
patent: 6163407 (2000-12-01), Okazaki et al.
patent: 6417022 (2002-07-01), Hsiao et al.
patent: 6495813 (2002-12-01), Fan et al.
patent: 6781762 (2004-08-01), Ozawa
patent: 2002/0102498 (2002-08-01), Hsin

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