Thyristor-based semiconductor device and method of fabrication

Semiconductor device manufacturing: process – Making regenerative-type switching device

Reexamination Certificate

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C438S139000

Reexamination Certificate

active

10958820

ABSTRACT:
A thyristor-based semiconductor memory device may comprise at least a region thereof, e.g., a p-base region, having high ionization energy impurity, such as a dopant. This high ionization energy impurity within a base region may be operable to compensate for a gain-versus-temperature dependence of a constituent bipolar transistor of the thyristor element of a thyristor-based memory device. In particular embodiments, the high ionization energy impurity may include a donor and/or acceptor in silicon.

REFERENCES:
patent: 3856586 (1974-12-01), Borchert et al.
patent: 4742382 (1988-05-01), Jaecklin
patent: 4965872 (1990-10-01), Vasudev
patent: 5448104 (1995-09-01), Yallup
patent: 5559349 (1996-09-01), Cricchi et al.
patent: 5627401 (1997-05-01), Yallup
patent: 5681763 (1997-10-01), Ham et al.
patent: 6087683 (2000-07-01), King et al.
patent: 6229161 (2001-05-01), Nemati et al.
patent: 6448586 (2002-09-01), Nemati et al.
patent: 6459140 (2002-10-01), Johansson et al.
patent: 6462359 (2002-10-01), Nemati et al.
patent: 6492662 (2002-12-01), Hsu et al.
patent: 6501099 (2002-12-01), Shah
patent: 6512274 (2003-01-01), King et al.
patent: 6528356 (2003-03-01), Nemati et al.
patent: 6545297 (2003-04-01), Noble, Jr. et al.
patent: 6552398 (2003-04-01), Hsu et al.
patent: 6583452 (2003-06-01), Cho et al.
patent: 6611452 (2003-08-01), Han
patent: 6627924 (2003-09-01), Hsu et al.
patent: 6653174 (2003-11-01), Cho et al.
patent: 6787816 (2004-09-01), Chow et al.
patent: 6888176 (2005-05-01), Horch et al.
patent: 7075122 (2006-07-01), Yang et al.
U.S. Appl. No. 10/706,162, filed Nov. 12, 2003, Nemati et al.
F.Nemati and J.D. Plummer, A Novel High Density, Low Voltage SRAM Cell with a Vertical NDR Device, VLSI Technology Technical Digest, 1998; 2 pages.
F.Nemati and J.D. Plummer, A Novel Thyristor-based SRAM Cell (T-RAM) for High-Speed, Low-Voltage, Giga-Scale Memories, Intl. Electron Device Mtg. Tech. Digest; 1999; 3 pages.
National Scientific Corp., TMOS Memory Cell, Breakthrough Technology in SRAM, at http://www.nsclocators.com/images/pdf/IP—tmos-2003.PDF, 2003.
R.Colin Johnson, Hybrid Tunnel Diodes Could Leapfrog Moore's Law, EE Times, Oct. 29, 2003, also at www.eetimes.com/at
ews/OEG20031029S0015; 4 pages.
I.C. Kizilyalli, A.S. Chen, et al.; Silicon NPN Bipolar Transistors with Indium-Implanted Base Regions; IEEE Electron Device Letters, vol. 18, No. 3, Mar. 1997; pp. 120-122.
V. Subramanium, et al.; Controlled Two-Step Solid Phase Crystalization for High-Performance Poly . . . ; IEEE Electron Device Letters; vol. 18, No. 8, Aug. 1997; pp. 378-381.
H.G. Grimmeiss, E. Janzen, et al.; Tellurium donors in silicon; The American Physical Society, vol. 24, No. 8, Oct. 15, 1981; pp. 4571-4586.
H.R. Vydyanath, J.S. Lorenzo, F.A. Kroger; Defect pairing diffusion, and solubllity studies in selenium-doped silicon; J. Appl. Phys. 49 (12); Dec. 1978; pp. 5928-5937.
A.A. Taskin and E.G. Tishkovskii; Formation of Selenium-Containing Complexes in Silicon; Semiconductors, vol. 36, No. 6, 2002; pp. 605-614.
American Semiconductor, Tunnel Diode and Back Diode, at Americanmicrosemi.com; undated; 4 pages.
V. Subramanian, et al.; A Novel Technique for In-Situ Monitoring of Crystallinity and Temperature during Rapid Thermal Annealing of Thin SI-SI-GE Films . . . ; undated; 6 pages.

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