Rapid scattering simulation of objects in imaging using edge...

Data processing: structural design – modeling – simulation – and em – Modeling by mathematical expression

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C703S006000, C716S030000, C430S005000

Reexamination Certificate

active

10677136

ABSTRACT:
A complex two-dimensional layout of a photomask or other three-dimensional object is systematically decomposed into a finite number of elementary two-dimensional objects with the ability to cause one-dimensional changes in light transmission properties. An algorithmic implementation of this can take the form of creation of a look-up table that stores all the scattering information of all two-dimensional objects needed for the synthesis of the electromagnetic scattered field from the original three-dimensional object. The domain is decomposed into edges, where pre-calculated electromagnetic field from the diffraction of isolated edges is recycled in the synthesis of the near diffracted field from arbitrary two-dimensional diffracting geometries. The invention has particular applicability in die-to-database inspection where an actual image of a mask is compared with a synthesized image that takes imaging artifacts of comers, edges and proximity into account. Another application is optical proximity correction which consists of evaluating the image of every feature on a mask and improving it by introducing edge shifts and iteratively adjusting the amounts of these shifts.

REFERENCES:
patent: 5447810 (1995-09-01), Chen et al.
patent: 6738859 (2004-05-01), Liebchen
patent: 2003/0064298 (2003-04-01), Broeke et al.
Adam et al, “Methodology for Accurate and Rapid Simulation of Large Arbitrary 2D Layouts of Advanced Photomasks”, 21stAnnual Bacus Symposium on Photomask Technology, Oct. 3, 2001.
Konstantinous Adam, “Domain Decomposition Methods for the Electromagnetic Simulation of scattering from Three-Dimensional Structures with Applications in Lithography”, A dissertation submitted in Fall 2001 to the University of California, Berkeley.
Adam et al., “Efficient Phase Defect Modeling using Domain Decomposition Methods”, EIPBN Conference, May 2002.
Adam et al., “SimplifiedModels for Edge Transitions in Rigorous Mask Modeling”, 26thAnnual Int'l Symposium on Microlithography, Mar. 1, 2001.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Rapid scattering simulation of objects in imaging using edge... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Rapid scattering simulation of objects in imaging using edge..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Rapid scattering simulation of objects in imaging using edge... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3755758

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.