Amorphous carbon-based non-volatile memory

Active solid-state devices (e.g. – transistors – solid-state diode – Bulk effect device – Bulk effect switching in amorphous material

Reexamination Certificate

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Details

C257S004000, C257S042000, C257SE45002, C257S002000

Reexamination Certificate

active

10899010

ABSTRACT:
A resistance variable memory element and a method for forming the same. The memory element has an amorphous carbon layer between first and second electrodes. A metal-containing layer is formed between the amorphous carbon layer and the second electrode.

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E. G. Gerstner et al. “Nonvolatile memory effects in nitrogen doped tetrahedral amorphous carbon thin films,” Journal of Applied Physics, vol. 84, No. 10, Nov. 15, 1998, pp. 5647-5651.

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