Resolution enhanced optical metrology

Optics: measuring and testing – Dimension – Width or diameter

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C356S601000, C356S625000, C250S559190, C250S559220, C250S559240

Reexamination Certificate

active

10447609

ABSTRACT:
A resolution enhanced optical metrology system to examine a structure formed on a semiconductor wafer includes a source configured to direct an incident beam at the structure through a coupling element. The coupling element is disposed between the source and the structure with a gap having a gap height defined between the coupling element and the structure.

REFERENCES:
patent: 5220403 (1993-06-01), Batchelder et al.
patent: 5940175 (1999-08-01), Sun
patent: 6775015 (2004-08-01), Bischoff et al.
patent: 6785638 (2004-08-01), Niu et al.
patent: 6891626 (2005-05-01), Niu
patent: 6934024 (2005-08-01), Zhan et al.
patent: 6943400 (2005-09-01), Manabe
patent: 6943900 (2005-09-01), Niu et al.
patent: 2003/0184761 (2003-10-01), Degertekin et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Resolution enhanced optical metrology does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Resolution enhanced optical metrology, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Resolution enhanced optical metrology will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3738468

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.