Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2007-01-23
2007-01-23
Kackar, Ram N. (Department: 1763)
Coating apparatus
Gas or vapor deposition
C118S728000, C118S725000, C118S724000, C156S345510, C156S345520, C156S345530
Reexamination Certificate
active
10259380
ABSTRACT:
The present invention presents an improved baffle plate for a plasma processing system, wherein the design and fabrication of the baffle plate advantageously provides for a uniform processing plasma in the process space with substantially minimal erosion of the baffle plate.
REFERENCES:
patent: 4310390 (1982-01-01), Bradley et al.
patent: 4357387 (1982-11-01), George et al.
patent: 4469619 (1984-09-01), Ohno et al.
patent: 4593007 (1986-06-01), Novinski
patent: 4612077 (1986-09-01), Tracy et al.
patent: 4649858 (1987-03-01), Sakai et al.
patent: 4842683 (1989-06-01), Cheng et al.
patent: 4877757 (1989-10-01), York et al.
patent: 5000113 (1991-03-01), Wang et al.
patent: 5074456 (1991-12-01), Degner et al.
patent: 5334462 (1994-08-01), Vine et al.
patent: 5362335 (1994-11-01), Rungta
patent: 5366585 (1994-11-01), Robertson et al.
patent: 5367838 (1994-11-01), Visaisouk et al.
patent: 5423936 (1995-06-01), Tomita et al.
patent: 5426310 (1995-06-01), Tamada et al.
patent: 5484752 (1996-01-01), Waku et al.
patent: 5494713 (1996-02-01), Ootuki
patent: 5521790 (1996-05-01), Ruckel et al.
patent: 5551190 (1996-09-01), Yamagishi et al.
patent: 5556501 (1996-09-01), Collins et al.
patent: 5614055 (1997-03-01), Fairbairn et al.
patent: 5637237 (1997-06-01), Oehrlein et al.
patent: 5641375 (1997-06-01), Nitescu et al.
patent: 5651723 (1997-07-01), Bjornard et al.
patent: 5680013 (1997-10-01), Dornfest et al.
patent: 5725960 (1998-03-01), Konishi et al.
patent: 5759360 (1998-06-01), Ngan et al.
patent: 5798016 (1998-08-01), Oehrlein et al.
patent: 5834070 (1998-11-01), Movchan et al.
patent: 5851343 (1998-12-01), Hsu
patent: 5868848 (1999-02-01), Tsukamoto
patent: 5879575 (1999-03-01), Tepman et al.
patent: 5885356 (1999-03-01), Zhao et al.
patent: 5885402 (1999-03-01), Esquibel
patent: 5891253 (1999-04-01), Wong et al.
patent: 5892278 (1999-04-01), Horita
patent: 5894887 (1999-04-01), Kelsey et al.
patent: 5895586 (1999-04-01), Kaji et al.
patent: 5900064 (1999-05-01), Kholodenko
patent: 5902763 (1999-05-01), Waku et al.
patent: 5911852 (1999-06-01), Katayama et al.
patent: 5919332 (1999-07-01), Koshiishi et al.
patent: 5925228 (1999-07-01), Panitz et al.
patent: 5944902 (1999-08-01), Redeker et al.
patent: 5948521 (1999-09-01), Dlugosch et al.
patent: 5952054 (1999-09-01), Sato et al.
patent: 5952060 (1999-09-01), Ravi
patent: 5955182 (1999-09-01), Yasuda et al.
patent: 5968377 (1999-10-01), Yuasa et al.
patent: 5985102 (1999-11-01), Leiphart
patent: 5994662 (1999-11-01), Murugesh
patent: 6068729 (2000-05-01), Shrotriya
patent: 6073449 (2000-06-01), Watanabe et al.
patent: 6096161 (2000-08-01), Kim et al.
patent: 6106625 (2000-08-01), Koai et al.
patent: 6110287 (2000-08-01), Aral et al.
patent: 6120640 (2000-09-01), Shih et al.
patent: 6120955 (2000-09-01), Tokutake et al.
patent: 6123791 (2000-09-01), Han et al.
patent: 6123804 (2000-09-01), Babassi et al.
patent: 6129808 (2000-10-01), Wicker et al.
patent: 6139983 (2000-10-01), Ohashi et al.
patent: 6143646 (2000-11-01), Wetzel
patent: 6170429 (2001-01-01), Schoepp et al.
patent: 6176969 (2001-01-01), Park et al.
patent: 6182603 (2001-02-01), Shang et al.
patent: 6210486 (2001-04-01), Mizukami et al.
patent: 6221202 (2001-04-01), Walko, II
patent: 6246479 (2001-06-01), Jung et al.
patent: 6264788 (2001-07-01), Tomoyasu et al.
patent: 6265757 (2001-07-01), Brady et al.
patent: 6266133 (2001-07-01), Miyajima et al.
patent: 6296740 (2001-10-01), Xie et al.
patent: 6335293 (2002-01-01), Luo et al.
patent: 6364949 (2002-04-01), Or et al.
patent: 6368987 (2002-04-01), Kopacz et al.
patent: 6373573 (2002-04-01), Jung et al.
patent: 6383333 (2002-05-01), Haino et al.
patent: 6383964 (2002-05-01), Nakahara et al.
patent: 6394026 (2002-05-01), Wicker et al.
patent: 6413578 (2002-07-01), Stowell et al.
patent: 6444083 (2002-09-01), Steger et al.
patent: 6514377 (2003-02-01), Morimoto
patent: 6519037 (2003-02-01), Jung et al.
patent: 6527911 (2003-03-01), Yen et al.
patent: 6533910 (2003-03-01), O'Donnell et al.
patent: 6537429 (2003-03-01), O'Donnell et al.
patent: 6544380 (2003-04-01), Tomoyasu et al.
patent: 6554906 (2003-04-01), Kuibira et al.
patent: 6562186 (2003-05-01), Saito et al.
patent: 6570654 (2003-05-01), Jung et al.
patent: 6583064 (2003-06-01), Wicker et al.
patent: 6590660 (2003-07-01), Jung et al.
patent: 6613204 (2003-09-01), Xie et al.
patent: 6613442 (2003-09-01), O'Donnell et al.
patent: 6641697 (2003-11-01), Han et al.
patent: 6663714 (2003-12-01), Mizuno et al.
patent: 6695929 (2004-02-01), Kanekiyo et al.
patent: 6726801 (2004-04-01), Ahn
patent: 6733620 (2004-05-01), Sugiyama et al.
patent: 6738862 (2004-05-01), Ross et al.
patent: 6776873 (2004-08-01), Sun et al.
patent: 6783863 (2004-08-01), Harada et al.
patent: 6783875 (2004-08-01), Yamada et al.
patent: 6798519 (2004-09-01), Nishimoto et al.
patent: 6805952 (2004-10-01), Chang et al.
patent: 6806949 (2004-10-01), Ludviksson et al.
patent: 6811651 (2004-11-01), Long
patent: 6830622 (2004-12-01), O'Donnell et al.
patent: 6833279 (2004-12-01), Choi
patent: 6837966 (2005-01-01), Nishimoto et al.
patent: 6852433 (2005-02-01), Maeda
patent: 6863594 (2005-03-01), Preising
patent: 6875477 (2005-04-01), Trickett et al.
patent: 6884516 (2005-04-01), Harada et al.
patent: 6894769 (2005-05-01), Ludviksson et al.
patent: 6896785 (2005-05-01), Shatrov et al.
patent: 2001/0003271 (2001-06-01), Otsuki
patent: 2001/0050144 (2001-12-01), Nishikawa et al.
patent: 2002/0076508 (2002-06-01), Chiang et al.
patent: 2002/0086118 (2002-07-01), Chang et al.
patent: 2002/0086501 (2002-07-01), O'Donnell et al.
patent: 2002/0086545 (2002-07-01), O'Donnell et al.
patent: 2002/0086553 (2002-07-01), O'Donnell et al.
patent: 2002/0090464 (2002-07-01), Jiang et al.
patent: 2002/0142611 (2002-10-01), O'Donnell et al.
patent: 2002/0177001 (2002-11-01), Harada et al.
patent: 2003/0010446 (2003-01-01), Kajiyama et al.
patent: 2003/0029563 (2003-02-01), Kaushal et al.
patent: 2003/0084848 (2003-05-01), Long
patent: 2003/0113479 (2003-06-01), Fakuda et al.
patent: 2003/0150419 (2003-08-01), Daragheh et al.
patent: 2003/0200929 (2003-10-01), Otsuki
patent: 2004/0026372 (2004-02-01), Takenaka et al.
patent: 2004/0035364 (2004-02-01), Tomoyoshi et al.
patent: 2004/0050495 (2004-03-01), Sumiya et al.
patent: 2004/0060516 (2004-04-01), Nishimoto et al.
patent: 2004/0060656 (2004-04-01), Saigusa et al.
patent: 2004/0060657 (2004-04-01), Saigusa et al.
patent: 2004/0060658 (2004-04-01), Nishimoto et al.
patent: 2004/0060661 (2004-04-01), Nishimoto et al.
patent: 2004/0060779 (2004-04-01), Kreger
patent: 2004/0061447 (2004-04-01), Saigusa et al.
patent: 2004/0063333 (2004-04-01), Saigusa et al.
patent: 2004/0072426 (2004-04-01), Jung
patent: 2004/0081746 (2004-04-01), Imafuku
patent: 2004/0083970 (2004-05-01), Imafuku et al.
patent: 2004/0125359 (2004-07-01), Ludviksson et al.
patent: 2004/0168640 (2004-09-01), Muto et al.
patent: 2004/0173155 (2004-09-01), Nishimoto et al.
patent: 2004/0216667 (2004-11-01), Mitsuhashi et al.
patent: 2005/0103268 (2005-05-01), Nishimoto et al.
patent: 2005/0103275 (2005-05-01), Sasaki et al.
patent: 2005/0150866 (2005-07-01), O'Donnell
patent: 2006/0134919 (2006-06-01), Hamelin et al.
patent: 94 21 671 (1996-07-01), None
patent: 0 508 731 (1992-10-01), None
patent: 0 573 057 (1993-12-01), None
patent: 0 799 904 (1997-10-01), None
patent: 0 814 495 (1997-12-01), None
patent: 0 841 838 (1998-05-01), None
patent: 1 069 603 (2001-01-01), None
patent: 1 081 749 (2001-03-01), None
patent: 1 156 130 (2001-11-01), None
patent: 2 252 567 (1992-08-01), None
patent: 61-207566 (1986-09-01), None
patent: 64-039728 (1989-02-01), None
patent: 01-312087 (1989-12-01), None
patent: 1-312087 (1989-12-01), None
patent: 02-267967 (1990-11-01), None
patent: 03-115535 (1991-05-01), None
patent: 04-238882 (1992-08-01), None
patent: 4-238882 (1992-08-01), None
patent: 05-070922 (1993-03-01), None
patent: 05-117064 (1993-05-01), None
patent: 05-121360 (1993-05-01), None
patent: 05-198532 (1993-08-01), None
patent: 05-238859 (1993-09-01), None
patent: 06-057396 (1994-03-01), None
patent: 06-136505 (1994-
Mitsuhashi Kouji
Nakayama Hiroyuki
Saigusa Hidehito
Takase Taira
Kackar Ram N.
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Tokyo Electron Limited
LandOfFree
Method and apparatus for an improved baffle plate in a... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for an improved baffle plate in a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for an improved baffle plate in a... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3734920