Method for making a contact magnetic transfer template

Details Method for making a contact magnetic transfer template Method for making a contact magnetic transfer template

2007-01-09

2007-01-09

Ahmed, Shamim (Department: 1765)

Etching a substrate: processes

Forming or treating article containing magnetically...

C216S088000, C438S692000, C438S740000, C029S603060, C029S603070

Reexamination Certificate

active

11044288

ABSTRACT:
A contact magnetic transfer (CMT) master template is made by first adhering a plastic film to a first surface of a silicon wafer. A resist pattern is then formed on the polyimide film and the polyimide is reactive-ion-etched through the resist to form recesses. The resist is removed and a chemical-mechanical-polishing (CMP) stop layer is deposited over the non-recessed regions of the polyimide, and optionally into the bottoms of the recesses. A layer of magnetic material is then deposited over the polyimide film to fill the recesses. A CMP process is then performed to remove magnetic material above the recesses and above the non-recessed regions and continued until the CMP stop layer is reached. The resulting upper surface of the polyimide film is then a continuous planar film of magnetic islands and regions of CMP stop layer material that function as the nonmagnetic regions of the template.

REFERENCES:
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patent: 6347016 (2002-02-01), Ishida et al.
patent: 6433944 (2002-08-01), Nagao et al.
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patent: 2002-342921 (2002-11-01), None
Ishida, T. et al., “Magnetic Printing Technology-Application to HDD”, IEEE Transactions on Magnetics, vol. 39, No. 2, Mar. 2003, pp. 628-632.

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