System and method utilizing a lithography tool having...

Details System and method utilizing a lithography tool having... System and method utilizing a lithography tool having...

2007-07-10

2007-07-10

Kim, Peter B. (Department: 2851)

Photocopying

Projection printing and copying cameras

Focus or magnification control

C355S053000, C355S067000

Reexamination Certificate

active

10853558

ABSTRACT:
A lithography system has a magnification module having multiple magnifications at a same time within an object plane, which can include a pattern generator therein. The pattern generator is used to pattern light from an illumination system, which is directed by a projection optical system onto a substrate to form features on a substrate. Having multiple magnifications in the object plate allows for patterning of both large and small features on an image plane, which can include the substrate therein. In one example, an array of pattern generators are used. In this example, substantially an entire surface of the substrate can be patterned with large and small features at substantially a same time.

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European Search Report, dated Apr. 19, 2006, for European Patent Application No. 05257490.2, 8 pages.

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