Method of forming patterned films

Radiation imagery chemistry: process – composition – or product th – Transfer procedure between image and image layer – image...

Reexamination Certificate

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C430S258000, C156S232000, C156S234000, C427S146000, C427S248100, C427S255600, C427S294000, C427S250000

Reexamination Certificate

active

10456472

ABSTRACT:
This method forms a patterned film. The method prepares a transfer member having a transfer surface on which asperities are formed in accordance with a film pattern to be formed, performs stripping treatment on surfaces of at least ridges formed on the transfer surface of the transfer member, thereafter forms a thin film formed by a technology of vacuum film formation on the surfaces of the at least ridges formed on the transfer surface of the transfer member and transfers the thin film formed on the surfaces of at least ridges of the transfer member onto a substrate, thereby forming the patterned film on the substrate.

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Changsoon Kim, et al.; “Nanolithography based on patterned metal transfer and its application to organic electronic devices”; Applied Physics Letters, vol. 80, No. 21, May 27, 2002, pp. 4051-4053.
Changsoon Kim, et al.; “Micropatterning of Organic Electronic Devices by Cold-Welding”; Science, vol. 288, May 5, 2000; pp. 831-833.
Thomas Granlund, et al.; “Patterning of Polymer Light-Emitting Diodes with Soft Lithography”; Advanced Materials; vol. 12, No. 4, Feb. 17, 2000; pp. 269-273.
Thomas Granlund et al.: “Patterning of Polymer Light-Emitting Diodes with soft Lithography”; Advanced Materials; vol. 12, No. 4, Feb. 17, 2000; pp. 269-273.

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