Semiconductor device manufacturing apparatus and...

Details Semiconductor device manufacturing apparatus and... Semiconductor device manufacturing apparatus and...

2007-05-22

2007-05-22

Graybill, David E. (Department: 2822)

Coating apparatus

With means to apply electrical and/or radiant energy to work...

Electrostatic and/or electromagnetic attraction or...

C118S640000, C427S508000, C427S509000, C427S510000

Reexamination Certificate

active

10626233

ABSTRACT:
A semiconductor device manufacturing apparatus which uses a thermal CVD reaction to deposit a film onto a substrate has a ring with an electrode terminal that makes contact with either the substrate or the deposited film thereon, a power supply that applies a current or a potential to this electrode terminal of the ring, and a piston cylinder mechanism for moving the ring up and down, so as to cause its electrode terminal to make and break contact with the substrate or deposited film thereon.

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57-39431 Publicaiton of Japanses Laid-Open Patent IPC 7th Edition H01L date unknown.

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