Image analysis – Applications – Manufacturing or product inspection
Patent
1998-01-27
2000-04-04
Au, Amelia
Image analysis
Applications
Manufacturing or product inspection
382294, 348 87, G06K 900
Patent
active
060470836
ABSTRACT:
A method and apparatus for pattern inspection forming an image of a specimen and inspecting a pattern formed on the specimen. This method includes the steps of storing a reference image corresponding to an image of the specimen into a memory, comparing the read out reference image from the memory with the image of the specimen, detecting differing portions between the reference image and image of the specimen as defects, and determining a probability of defects being or becoming a killer defect (i.e., a defect causing failure) of the specimen from other defects based on the detected differing portions.
REFERENCES:
patent: 5544256 (1996-08-01), Brecher et al.
patent: 5801965 (1998-09-01), Takagi et al.
Au Amelia
Bali Vikkram
Hitachi , Ltd.
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