Exposure method and apparatus

Details Exposure method and apparatus Exposure method and apparatus

2006-12-05

2006-12-05

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S067000, C355S071000, C378S034000, C378S035000

Reexamination Certificate

active

07145635

ABSTRACT:
An exposure apparatus includes a projection optical system for projecting a pattern on a mask onto an object to be exposed, a final surface of the projection optical system and a surface of the object immersed in a fluid, and a plane-parallel plate arranged between the projection optical system and the object. The plane-parallel plate includes a first surface and a second surface that serves as a back surface of the first surface and opposes to the object. Both the first and second surfaces are immersed in the fluid and the plane-parallel plate has an antireflection coating that is designed according to an incident light at an angle corresponding to a numerical aperture of the projection optical system.

REFERENCES:
patent: 2003/0020893 (2003-01-01), Kawashima
patent: 2004/0240071 (2004-12-01), Kawashima
patent: 2005/0030506 (2005-02-01), Schuster
patent: 2005/0248856 (2005-11-01), Omura et al.
patent: 2005/0286030 (2005-12-01), Shih et al.
patent: 2006/0098180 (2006-05-01), Bleeker
patent: 10-303114 (1998-11-01), None
patent: 2003-017396 (2003-01-01), None
patent: 2003-135578 (2003-05-01), None

Affiliated with

Also associated with

Rating

Exposure method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure method and apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3717368