Semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S211000, C257S760000, C257SE21577, C257SE21578, C257SE21579

Reexamination Certificate

active

07119442

ABSTRACT:
A semiconductor device comprising a first insulating layer formed above a semiconductor substrate, and comprising a first insulating material, a second insulating material and a hole, a relative dielectric constant of the first insulating material being 3 or less, a Young's modulus of the first insulating material being 10 GPa or less, a linear expansivity of the first insulating material being greater than 30×10−6° C.−1, and a linear expansivity of the second insulating material being 30×10−6° C.−1or less, and a second insulating layer formed on the first insulating layer, the second insulating layer having a groove connected to the hole, wherein a linear expansivity α of the first insulating layer within 6 μm from the hole is 30×10−6° C.−1or less, whereα=∑i=1⁢vi⁢αi,viand αiare a volume ratio and a linear expansivity of an i-th insulating material.

REFERENCES:
patent: 6713873 (2004-03-01), O'Loughlin et al.
patent: 2003/0116854 (2003-06-01), Ito et al.
patent: 2005/0116348 (2005-06-01), Minamihaba et al.
patent: 11-054621 (1999-02-01), None
patent: 2003-197742 (2003-07-01), None
patent: 2003-289099 (2003-10-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3711366

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.