Mask for light exposure and method for manufacturing liquid...

Details Mask for light exposure and method for manufacturing liquid... Mask for light exposure and method for manufacturing liquid...

2006-06-27

2006-06-27

Elve, M. Alexandra (Department: 1725)

Electric heating

Metal heating

By arc

C219S121850

Reexamination Certificate

active

07067764

ABSTRACT:
Light exposure areas103and light masking areas104in a sole reticle are arrayed in alternation to one another in both the longitudinal and transverse directions. Substrate is exposed to light by multi-domain light exposure using this reticle so that the respective areas of the reticle exposed to light with respective shots A to B, B to C . . . , N to M are not adjacent to one another in the boundary portions of the reticle shifted for executing the respective shots, thus relaxing the difference in illuminance between the respective shots and the difference in finish of the boundary portions of the shots, such differences becoming imperceptible to human eyes upon displaying liquid crystal display apparatus.

REFERENCES:
patent: 6816207 (2004-11-01), Jung
patent: 2000-180894 (2000-06-01), None

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