Method of inspecting a pattern and an apparatus thereof and...

Details Method of inspecting a pattern and an apparatus thereof and... Method of inspecting a pattern and an apparatus thereof and...

2006-10-03

2006-10-03

Chawan, Sheela (Department: 2624)

Image analysis

Applications

Manufacturing or product inspection

C382S172000, C250S305000, C250S306000, C356S237200

Reexamination Certificate

active

07116816

ABSTRACT:
In order to enable the most suitable image processing condition to be set as one in which a dispersion in brightness between comparing images caused by object to be inspected and an image detecting system is not applied as a false information, in the present invention, there is obtained a noise characteristic of a secondary electron image caused by the image detecting system is calculated, the most suitable image processing parameters are determined depending on the object to be inspected on the basis of the characteristic, and its comparing processing is performed by using the noise characteristic and the image of the object to be inspected, thereby a dispersion in process for the object to be inspected is evaluated.

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