Method for the generation of variable pitch nested lines...

Details Method for the generation of variable pitch nested lines... Method for the generation of variable pitch nested lines...

2006-06-20

2006-06-20

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S030000, C716S030000

Reexamination Certificate

active

07063920

ABSTRACT:
Provided is a method and system for developing a lithographic mask layout. The lithographic mask layout is adapted for configuring an array of micro-mirrors in a maskless lithography system. The method includes generating an ideal mask layout representative of image characteristics associated with a desired image. Next, an equivalent mask is produced in accordance with an average intensity of the ideal mask layout.

REFERENCES:
patent: 6038020 (2000-03-01), Tsukuda
patent: 6544698 (2003-04-01), Fries
Sandstrom, Tor et al., Resolution Extensions in the Sigma 7000 Imaging Pattern Generator, Micronic Laser Systems AB, Strategic Development, Molndalsvagen 91, SE-435 Goteborg, Sweden, 11 pages.
Search Report, from Singapore Patent Appl. No. SG 200402578-9, 3 pages, mailed Dec. 17, 2004.

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