Photomask, method of manufacturing a photomask, and method...

Details Photomask, method of manufacturing a photomask, and method... Photomask, method of manufacturing a photomask, and method...

2006-08-29

2006-08-29

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S030000, C430S311000

Reexamination Certificate

active

07097946

ABSTRACT:
A photomask comprises a substrate, a translucent film selectively formed on the substrate, and a shading film selectively formed on the translucent film, wherein when the substrate, the translucent film and the shading film have Young's moduli (MPa) E0E1and E2, and film thickness (m) d0, d1and d2respectively, internal stresses (MPa) of the translucent film and the shading film at room temperature are s1and s2respectively, a covering rate by the translucent film defined by an area in which the shading film is not formed is expressed as h, and coefficients are expressed as k1=1.3×10−8, k2=−9.5×10−2, k3=6.0×10−7, and k4=−5.2×10−2respectively, the substrate, the translucent film and the shading film satisfy a condition given by the following expression:1E0·d0·{h·(k1·S1E1·d1+k2)+(k3·S2E2·d2+k4)}≦1.4×10-4⁢(m-1).

REFERENCES:
patent: 2002/0061452 (2002-05-01), Nozawa et al.
patent: 2002-162727 (2002-02-01), None

Affiliated with

Also associated with

Rating

Photomask, method of manufacturing a photomask, and method... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photomask, method of manufacturing a photomask, and method..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomask, method of manufacturing a photomask, and method... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3700037