Photomask and pattern forming method employing the same

Details Photomask and pattern forming method employing the same Photomask and pattern forming method employing the same

2006-10-03

2006-10-03

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000

Reexamination Certificate

active

07115344

ABSTRACT:
A semitransparent phase shifting mask has, in the periphery of a pattern element area, a light shielding portion which is formed by a semitransparent phase shifting portion and a transparent portion with the optimal size combination. A pattern is formed employing the semitransparent phase shifting mask.

REFERENCES:
patent: 4360586 (1982-11-01), Flanders et al.
patent: 4890309 (1989-12-01), Smith et al.
patent: 5328807 (1994-07-01), Tanaka et al.
patent: 5364716 (1994-11-01), Nakagawa et al.
patent: 5429897 (1995-07-01), Yoshioka et al.
patent: 5472813 (1995-12-01), Nakagawa et al.
patent: 5574492 (1996-11-01), Suzuki
patent: 5589305 (1996-12-01), Tomofuji et al.
patent: 5595844 (1997-01-01), Tomofuji et al.
patent: 5660956 (1997-08-01), Tomofuji et al.
patent: 5837405 (1998-11-01), Tomofuji et al.
patent: 6660438 (2003-12-01), Tanaka et al.
patent: 62-50811 (1987-10-01), None
patent: 144453 (1991-06-01), None
patent: 269532 (1991-12-01), None
patent: 4-136854 (1992-05-01), None
patent: 4-204653 (1992-07-01), None
patent: 4-223464 (1992-08-01), None
patent: 1750/95 (1995-02-01), None
Watanabe, et al., “Transparent Phase Shifting Mask”;IEDM Technical Digest.International Electron Devices Meeting 1990, pp. 821-824.
Terasawa, et al., “Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks.”Japanese Journal of Applied Physics,vol. 30, No. 11B (1991), pp. 2991-2997.
Flanders et al, “Spatial period division—A new technique for exposing submicrometer-line width periodic and quasiperiodic patterns”, Journal of Vaccum Science Technology, 16(6), Nov./Dec. 1979, pp. 1949-1952.

Affiliated with

Also associated with

Rating

Photomask and pattern forming method employing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photomask and pattern forming method employing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomask and pattern forming method employing the same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3699838