Exposure apparatus

Details Exposure apparatus Exposure apparatus

2006-06-06

2006-06-06

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C356S401000, C250S398000, C250S3960ML, C250S397000

Reexamination Certificate

active

07057193

ABSTRACT:
An exposure apparatus which draws a pattern on a substrate with electron beams. The apparatus includes a substrate stage which supports the substrate, a transfer stage which moves the substrate stage, an electromagnetic actuator which moves the substrate stage relative to the transfer stage, a first measurement system which measures a position of the transfer stage, a second measurement system which measures a position of the substrate stage, a controller which controls the electromagnetic actuator on the basis of measurement results obtained by the first and second measurement systems, a deflector which deflects electron beams with which the substrate is irradiated, and a filter which performs filtering for a measurement result obtained by the second measurement system and supplies the filtered measurement result to the deflector.

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Japanese Office Action dated Jun. 6, 2005, issued in corresponding Japanese patent application number 2002-255110.

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