Coating apparatus – Gas or vapor deposition – Multizone chamber
Reexamination Certificate
2006-11-28
2006-11-28
Moore, Karla (Department: 1763)
Coating apparatus
Gas or vapor deposition
Multizone chamber
C156S345310, C414S935000, C414S937000, C414S940000
Reexamination Certificate
active
07141120
ABSTRACT:
A manufacturing apparatus of a semiconductor device includes an introducing section, a process section, and a withdrawing section. The introducing section introduces a transfer box therein. The process section takes in the semiconductor substrate put in the introducing section and applies a prescribed processing to the semiconductor substrate. Further, the withdrawing section is arranged on a surface differing from the surface on which the introducing section is arranged and discharges the transfer box holding the semiconductor substrate withdrawn from the process section of the semiconductor substrate.
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Notification for Filing Opinion issued by Korean Patent Office, mailed Sep. 24, 2004, for Korean Application NO. 10-2002-7016067, and English-language translation.
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
Moore Karla
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