Reflective mask with high inspection contrast

Details Reflective mask with high inspection contrast Reflective mask with high inspection contrast

2006-10-10

2006-10-10

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07118832

ABSTRACT:
A reflective mask may include an anti-reflective (AR) coating on an absorber layer to improve inspection contrast in an inspection system using deep ultraviolet (DUV) light. A silicon nitride (Si3N4) AR coating may be used on a chromium (Cr) or tantalum nitride (TaN) absorber layer.

REFERENCES:
patent: 6013399 (2000-01-01), Nguyen
patent: 6506526 (2003-01-01), Stivers et al.
patent: 6699625 (2004-03-01), Lee et al.
patent: 6720118 (2004-04-01), Yan et al.
patent: 6908714 (2005-06-01), Yan et al.
patent: 2003/0039922 (2003-02-01), Han et al.
patent: 2004/0091789 (2004-05-01), Han et al.
Pei-Yang Yan et al., TaN EUVL Mask Fabrication and Characterization; Proc. SPIE vol. 4343 (2001) p. 409-414.

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