Active solid-state devices (e.g. – transistors – solid-state diode – Organic semiconductor material
Reexamination Certificate
2006-06-27
2006-06-27
Andujar, Leonardo (Department: 2826)
Active solid-state devices (e.g., transistors, solid-state diode
Organic semiconductor material
Reexamination Certificate
active
07067840
ABSTRACT:
A method for selectively doping an organic semiconductor1material in the region of a contact area .1formed between a contact and the organic semiconductor material disposed thereon includes introducing the dopant with the aid of nanoparticles, the nanoparticles being disposed in a manner adjoining the contact area and, as a result, only a very narrow region of the organic semiconductor material being doped. The field increase effected by the nanoparticles results in a further reduction of the contact resistance.
REFERENCES:
patent: 5574291 (1996-11-01), Dodabalapur et al.
patent: 5705826 (1998-01-01), Aratani et al.
patent: 6646302 (2003-11-01), Kan et al.
patent: 99/48337 (1999-09-01), None
Johannes Schmitt et al.: “Metal Nanoparticle/polymer Superlattice Films:□□Fabrication and Control of Layer Structure”, Adv. Mater., vol. 9, 1997, No. 1, □□pp. 61-65.
Venkat Narayanan et al.: “Reduction of Metal-semiconductor Contact□□Resistance by Embedded Nanocrystals”, 2000 International Electron Device□□Meeting Technical Digest, 2000 IEEE.
Hagen Klauk et al.: A reduced complexity process for organic thin film□□transistorsl, Applied Physics Letters, vol. 76, No. 13, Mar. 27, 2000, pp.□□1692-1694.
Klauk Hagen
Schmid Günter
Andujar Leonardo
Greenberg Laurence A.
Infineon - Technologies AG
Locher Ralph E.
Stemer Werner H.
LandOfFree
Method and device for reducing the contact resistance in... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and device for reducing the contact resistance in..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and device for reducing the contact resistance in... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3692104