Method of manufacturing semiconductor device including...

Details Method of manufacturing semiconductor device including... Method of manufacturing semiconductor device including...

2006-11-21

2006-11-21

Chen, Kin-Chan (Department: 1765)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S585000, C438S714000

Reexamination Certificate

active

07138339

ABSTRACT:
A method of manufacturing a semiconductor device comprising forming an insulating layer above a semiconductor layer, forming a conductive layer including at least tantalum and tantalum nitride, and etching the conductive layer with using a gas including SiCl4and NF3.

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