Non-volatile memory cell having dual avalanche injection element

Static information storage and retrieval – Floating gate – Particular connection

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

36518531, 3651851, 36518518, 36518527, 365187, 365188, 257318, 257319, 257320, 257322, G11C 1604

Patent

active

060348933

ABSTRACT:
A non-volatile memory cell includes a well region formed in a semiconductor substrate. First and second avalanche injection elements reside in the well region. A bifurcated floating-gate electrode includes a first segment overlying the first avalanche injection element and a second segment overlying the second avalanche injection element. A first contact region resides in the well region adjacent to the first segment of the floating-gate electrode, and a second contact region resides in the well region adjacent to the second segment of the floating-gate electrode. Upon the application of programming or erasing voltage, electrical charge is independently transferred to each of the first and second segments of the floating-gate electrode from the first and second avalanche injection elements, respectively.

REFERENCES:
patent: 5646901 (1997-07-01), Sharpe-Geisler et al.
patent: 5666309 (1997-09-01), Peng et al.
patent: 5748525 (1998-05-01), Wong et al.
U.S. Application No. 09/334,051 filed Jun. 15, 1999 by Mehta et al., entitled "Zero-Power CMOS Nonvolatile Memory Cell Having an Avalanche Injection Element", now allowed.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Non-volatile memory cell having dual avalanche injection element does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Non-volatile memory cell having dual avalanche injection element, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Non-volatile memory cell having dual avalanche injection element will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-369146

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.